Onpharma Es

Onset technology included in D4D's Get Fit Faster campaign to enhance CAD/CAM efficiency and profitability

Feb. 21, 2013
Onpharma Inc., the maker of the Onset family of chairside anesthetic buffering products, announced that it has been selected for the D4D Technologies Get Fit Faster campaign for greater efficiency and profitability in same-day CAD/CAM dentistry.
February 21, 2013 (Los Gatos, CA) – Onpharma Inc., the maker of the Onset family of chairside anesthetic buffering products, announced that it has been selected for the D4D Technologies Get Fit Faster campaign for greater efficiency and profitability in same-day CAD/CAM dentistry.

Get Fit Faster will educate clinicians about four key time-saving tools that optimize efficiency and profitability of CAD/CAM Dentistry. The Get Fit Faster program will show clinicians how these four technologies can save them up to 40 minutes per CAD/CAM restorative procedure.

The Get Fit Faster time-saving model starts by using Onset to buffer the local anesthetic injection, which allows CAD/CAM clinicians to achieve pulpal anesthesia so fast that they no longer need to leave the patient while the anesthetic takes effect. Using Onset, clinicians go to work right away.

D4D’s Get Fit Faster campaign highlights the time-savings that clinicians can capture by utilizing Ivoclar Vivadent’s IPS e.max Speed Crystallization, 3M’s Lava Ultimate nano resin ceramic material, and Onpharma’s Onset in conjunction with E4D CAD/CAM technology.

“Onset allows Dentists utilizing CAD/CAM technology to improve the efficiency and workflow of an entire restorative procedure. Dentists no longer have to leave the patient’s side while they wait to achieve pulpal anesthesia. In the Get Fit Faster program, D4D CAD/CAM technology, combined with Onset and leading edge materials, creates a more efficient appointment with a greater sense of focus on the patient. The result is a more profitable practice with more satisfied patients,” said Michael D. Brown, VP Marketing & Sales – Onpharma Inc.